Ak. Vorobev et al., INFLUENCE OF WORKING GAS-PRESSURE ON THE PROPERTIES OF THIN-FILMS OF HIGH-TEMPERATURE SUPERCONDUCTORS OBTAINED BY MAGNETRON SPUTTERING, Technical physics letters, 24(2), 1998, pp. 159-161
The surface morphology, composition, microstructure, and electrical pr
operties of thin films of YBa2Cu3O7-x high-temperature superconductors
, obtained by inverted magnetron sputtering, have been studied as a fu
nction of the pressure of the working gas mixture and results are pres
ented. The main parameters of the magnetron discharge plasma near the
substrate were determined by analyzing the characteristics of Langmuir
probes. Changes in the properties of the films are considered to be c
aused by bombardment of the growing film with plasma ions accelerated
in the floating potential field of the substrate. Films obtained at a
pressure of 28 Pa and substrate temperature of 630 degrees C had a sup
erconducting transition end temperature T-c,T- (off) = 89 K and a crit
ical current density j(c) = 2 MA/cm(2) (at 77 K) and were free from se
condary phase particles larger than 10 nm. (C) 1998 American Institute
of Physics. [S1063-7850(98)03302-3].