Ca. Anderson et al., STUDIES OF THE EVOLUTION OF THE TOPOGRAPHY OF SELECTED MATERIALS AS AFUNCTION OF ETCHING IN REACTIVE AND NONREACTIVE RF PLASMAS (VOL 97, PG 151, 1997), Surface & coatings technology, 106(1), 1998, pp. 82-89
Examples of the evolution of the topography of selected materials (syn
thetic graphite, molybdenum disulphide and muscovite mica) as a functi
on of reactive (in oxygen) and nonreactive (in argon) etching in a 13.
56 MHz plasma are considered. The dependence of the observed topograph
y and its regular and semi-regular characteristic details on the power
levels, gas pressures and treatment times is demonstrated, particular
ly at sub-micron scales. The topographical images, derived roughness a
nd other data (obtained variously using scanning tunnelling microscopy
and atomic force microscopy) are discussed with respect to the layer
lattice structure of the materials processed. (C) 1998 Published by El
sevier Science S.A.