M. Fujiwara et al., A MECHANISM OF PHOTODISSOCIATION OF DIPHENYLMETHANE TO A DIPHENYLMETHYL RADICAL IN SOLUTION, The Journal of chemical physics, 109(4), 1998, pp. 1359-1365
The photodissociation of diphenylmethane by excitation to the S-1 stat
e at 266 nm in n-heptane solution is studied by nanosecond fluorescenc
e and absorption spectroscopy. The formation of the diphenylmethyl rad
ical is identified by its fluorescence, which is induced by excitation
at 308 nm, and by its absorption. The growth rate of (3.7 +/- 0.4) x
10(7) s(-1) for the radical is equal to the decay rate of (3.8 +/- 0.4
) x 10(7) s(-1) for the precursor fluorescence. The quantum yield of t
he radical is of the order of similar to 10(-3). Neither dissociation
to the radical nor intersystem crossing to the T-1 state is thermally
activated, whereas activated internal conversion to the S-0 state is o
bserved. The formation of the radical depends linearly on the photolys
is pulse fluence. The data are consistent with a mechanism that the mo
lecule undergoes intersystem crossing from thermally equilibrated leve
ls of the S-1 state to vibrationally excited levels of the T-1 state a
t which it dissociates in competition with vibrational relaxation. The
mechanism is explained in terms of electronic coupling between the pr
ecursor and product states. The S-1 state does not correlate adiabatic
ally to the ground state of the C-H bond fission products, so intersys
tem crossing to the T-1 state precedes dissociation. In the T-1 state,
avoided crossing between the pi pi (benzene) configuration and the s
igma sigma (C-H) repulsive configuration results in the adiabatic pot
ential energy surface which evolves to the ground state of the C-H bon
d fission products allowing rapid dissociation. (C) 1998 American Inst
itute of Physics.