The real part of the permittivity of annealed low temperature grown ga
llium arsenide (LTG GaAs) has been measured via capacitance measuremen
ts taken on p-i-n devices. The intrinsic region of the devices contain
ed LTG GaAs annealed at 700? 800, and 900 degrees C for 30 s. The capa
citance trends as a function of frequency for the annealed LTG GaAs sa
mples were compared to that of GaAs grown at a standard substrate temp
erature. An increased screening of the electric field was observed for
the LTG samples as the test frequency was lowered. The capacitance me
asurements were taken at various test temperatures, enabling the compu
tation of an activation energy of the electric field screening in the
annealed LTG GaAs from Arrhenius plots. (C) 1998 American Institute of
Physics. [S0003-6951(98)04631-2].