Green light emission at room temperature was achieved from nonhydrogen
ated amorphous silicon-nitrogen (a-SiN) thin films. The films were dep
osited by cosputtering a silicon target covered with metallic erbium p
latelets in an Ar+N-2 atmosphere. According to the deposition conditio
ns, the nitrogen concentration [N] reached similar to 40 at. % renderi
ng an optical gap of approximately 3.5 eV while the Er concentration [
Er] was estimated to be similar to 10 at. % in the present films. The
high [Er] associated to the optical band gap allows the direct excitat
ion of Er3+ ions. This optical excitation is more efficient at low tem
peratures as a consequence of the reduction in nonradiative processes,
and when exciting the samples with the 488.0 nm line of an Ar+ laser
which is in resonance with the (F7/2Er3+)-F-4 energy level. In additio
n to light emission at similar to 520 and similar to 545 nm, transitio
ns in the infrared energy region could be easily verified in as-deposi
ted samples. (C) 1998 American institute of Physics.