F. Borner et al., DETERMINATION OF THE DEFECT DEPTH PROFILE AFTER SAW CUTTING OF GAAS WAFERS MEASURED BY POSITRON-ANNIHILATION, Journal of applied physics, 84(4), 1998, pp. 2255-2262
Positron Lifetime measurements and Doppler broadening spectroscopy usi
ng slow positrons were combined to investigate open-volume defects cre
ated by sawing wafers from GaAs ingots by a diamond saw cutter. It was
found during step-by-step polishing that the depth distribution repre
sents a wedgelike profile. The depth and the concentration of the defe
cts introduced by the diamond saw depend on the advance of the saw bla
de. An isochronal annealing experiment was carried out to study the th
ermal stability of the observed defects. The positron lifetime of the
dominant open-volume defect was estimated to be. larger than 330 ps. I
t was concluded from this lifetime value and from the Doppler broadeni
ng parameters as well as from the annealing behavior that vacancy aggr
egates consisting of at least two vacancies are created by the sawing
procedure. More extended defects such as microcracks were analyzed by
scanning electron microscopy. (C) 1998 American Institute of Physics.
[S0021-8979(98)04516-2].