D. Buttard et al., THIN-LAYERS AND MULTILAYERS OF POROUS SILICON - X-RAY-DIFFRACTION INVESTIGATION, Journal of applied physics, 83(11), 1998, pp. 5814-5822
Porous silicon is a unique example of a porous material exhibiting the
properties of a nearly perfect single crystal. High resolution x-ray
diffraction has been used to investigate thin p(-) and p(+) type porou
s silicon layers in the 100-1000-nm-thickness range; Since several thi
ckness fringes are observed, the comparison between experimental resul
ts and simulations enables one to deduce information about the main st
ructural parameters such as porosity, lattice parameter, thickness, an
d heterotransition width. Porous silicon multilayers have also been in
vestigated: some satellites an clearly observed. The obtained results
are then compared and discussed with the literature. (C) 1998 American
Institute of Physics. [S0021-8979(98)04511-3].