OPTOELECTRONIC AND STRUCTURAL-PROPERTIES OF A-GE1-XCX-H PREPARED BY RF REACTIVE COSPUTTERING

Citation
J. Vilcarromero et al., OPTOELECTRONIC AND STRUCTURAL-PROPERTIES OF A-GE1-XCX-H PREPARED BY RF REACTIVE COSPUTTERING, Journal of applied physics, 84(1), 1998, pp. 174-180
Citations number
50
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
84
Issue
1
Year of publication
1998
Pages
174 - 180
Database
ISI
SICI code
0021-8979(1998)84:1<174:OASOAP>2.0.ZU;2-C
Abstract
Optoelectronic, structural, and mechanical properties of hydrogenated amorphous germanium carbon (a-Ge1-xCx:H) alloys are presented. The fil ms were prepared by the rf cosputtering technique using graphite-germa nium composite targets. Films with carbon contents in the 0<x <1 range were prepared under the same conditions used to obtain a-Ge:H films w ith good optoelectronic properties. The trends of the optical gap, inf rared absorption, dark conductivity, and mechanical stress as a functi on of the carbon content suggest that the properties of films with low carbon concentration are mainly controlled by the incorporation of sp (3) hybridized carbon. These films have good optoelectronic and struct ural properties. As the carbon content increases, the properties of th e films are determined by the concentration of sp(2) carbon sites. (C) 1998 American Institute of Physics.