DIRECT EVIDENCE OF IMPACT EXCITATION AND SPATIAL PROFILING OF EXCITEDER IN LIGHT-EMITTING SI DIODES

Citation
S. Coffa et al., DIRECT EVIDENCE OF IMPACT EXCITATION AND SPATIAL PROFILING OF EXCITEDER IN LIGHT-EMITTING SI DIODES, Applied physics letters, 73(1), 1998, pp. 93-95
Citations number
13
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
73
Issue
1
Year of publication
1998
Pages
93 - 95
Database
ISI
SICI code
0003-6951(1998)73:1<93:DEOIEA>2.0.ZU;2-5
Abstract
We provide direct evidence that Er ions incorporated in the depletion layer of a p(+)-n(+) Si junction are efficiently pumped through an imp act excitation process with hot carriers. The carriers were accelerate d by the electric field present in the depletion layer after being pro duced by either Zener breakdown of the junction at similar to 5 V or b y irradiating the diode with an argon laser. Measurements of the elect roluminescence yield at 1.54 mu m as a function of the reverse bias vo ltage (and for a constant current through the device) reveal that exci tation of Er only occurs at voltages above 1 V, demonstrating that imp act is the pumping mechanism. Moreover, we have found that Er ions are only excited within similar to 15 nm from the edges of the depletion layer leaving a dark, similar to 50 nm thick, region in the central pa rt of the depletion region. Monte Carlo calculations confirmed that on ly close to the depletion layer edges the energy gained by the carrier s in the electric held is high enough to impact excite Er. (C) 1998 Am erican Institute of Physics.