ENHANCED STABILITY OF DEUTERIUM IN SILICON

Citation
R. Biswas et al., ENHANCED STABILITY OF DEUTERIUM IN SILICON, Applied physics letters, 72(26), 1998, pp. 3500-3502
Citations number
18
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
72
Issue
26
Year of publication
1998
Pages
3500 - 3502
Database
ISI
SICI code
0003-6951(1998)72:26<3500:ESODIS>2.0.ZU;2-0
Abstract
Tight-binding molecular dynamics has been used to simulate vibrational ly excited Si-H and Si-D modes. Simulations find that vibrationally ex cited Si-D bending modes decay much more rapidly than SI-H bending mod es, re-suiting in SiD bonds having much higher stability than SiH bond s. This provides a viable mechanism for reduced degradation in deutera ted metal-oxide-semiconductor transistors and deuterated amorphous sil icon devices. (C) 1998 American Institute of Physics.