NEAR-FIELD OPTICAL STUDY OF INGAN GAN EPITAXIAL LAYERS AND QUANTUM-WELLS/

Citation
A. Vertikov et al., NEAR-FIELD OPTICAL STUDY OF INGAN GAN EPITAXIAL LAYERS AND QUANTUM-WELLS/, Applied physics letters, 72(21), 1998, pp. 2645-2647
Citations number
19
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
72
Issue
21
Year of publication
1998
Pages
2645 - 2647
Database
ISI
SICI code
0003-6951(1998)72:21<2645:NOSOIG>2.0.ZU;2-2
Abstract
We have employed near-field scanning optical microscopy to investigate the influence of specific microstructural defects on the optical prop erties of thin InGaN/GaN epilayers and quantum wells. These defects ar e empty ''pinholes'' with a hexahedron cone morphology that are nuclea ted by threading dislocations from the GaN buffer layer. By correlatin g atomic force microscopy With spatially and spectrally resolved photo luminescence (PL) on a 100 nm spatial scale, we find that the pinholes have no clearly observable effect on the PL efficiency, at least part ly due to the strong carrier localization in the InGaN nonrandom alloy . (C) 1998 American Institute of Physics.