ATOMIC-FORCE MICROSCOPY AND X-RAY REFLECTIVITY STUDIES OF ALBUMIN ADSORBED ONTO SELF-ASSEMBLED MONOLAYERS OF HEXADECYLTRICHLOROSILANE

Citation
Nb. Sheller et al., ATOMIC-FORCE MICROSCOPY AND X-RAY REFLECTIVITY STUDIES OF ALBUMIN ADSORBED ONTO SELF-ASSEMBLED MONOLAYERS OF HEXADECYLTRICHLOROSILANE, Langmuir, 14(16), 1998, pp. 4535-4544
Citations number
44
Categorie Soggetti
Chemistry Physical
Journal title
ISSN journal
07437463
Volume
14
Issue
16
Year of publication
1998
Pages
4535 - 4544
Database
ISI
SICI code
0743-7463(1998)14:16<4535:AMAXRS>2.0.ZU;2-D
Abstract
Atomic force microscopy (AFM) and X-ray reflectivity (XR) have been us ed together to provide a detailed and direct look at the structure of human serum albumin protein adsorbed onto well-characterized self-asse mbled monolayer (SAM) surfaces at several protein concentrations. The duration of SAM deposition was also varied to investigate the influenc e of the density of hydrocarbon chains in the SAM on protein binding t enacity. Concurrent study of adsorption to bare silicon wafers with na tive oxide surfaces provided a comparison with a hydrophilic surface s imilar to widely studied glass and quartz surfaces. Both AFM and XR me asurements showed that after adsorption, rinsing, and drying, the surf aces of all substrates were covered with no more than a single layer o f adsorbed protein. Thin dense protein layers were seen for the substr ates exposed to protein concentrations of 0.1 and 0.5 mg/mL. Partial s urface coverage by protein aggregates having larger thicknesses was se en for substrates exposed to lower concentrations. The tenacity of the protein adsorption on different substrates was tested by eluting the adsorbed protein with a 1% solution of sodium dodecyl sulfate surfacta nt. This treatment removed almost all protein from the bare silicon su rface and from the fully formed, dense SAMs. A significant amount of a dsorbed protein remained on the surface of the less dense, ''incomplet e'' monolayers, suggesting that protein adsorbed more tenaciously on t hat surface.