STUDY OF CDTE ETCHING PROCESS IN ALCOHOLIC SOLUTIONS OF BROMINE

Citation
Im. Kotina et al., STUDY OF CDTE ETCHING PROCESS IN ALCOHOLIC SOLUTIONS OF BROMINE, Semiconductor science and technology, 13(8), 1998, pp. 890-894
Citations number
17
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Condensed Matter","Material Science
ISSN journal
02681242
Volume
13
Issue
8
Year of publication
1998
Pages
890 - 894
Database
ISI
SICI code
0268-1242(1998)13:8<890:SOCEPI>2.0.ZU;2-0
Abstract
Changes in the structure and stoichiometry of the p-CdTe surface as a result of etching have been studied by high-resolution x-ray photoelec tron spectroscopy and the Rutherford backscattering method. Etching wi th bromine-methanol and bromine-butanol solutions is shown to enrich t he surface with elementary tellurium (Te-0). The etching process is an isotropic, in particular, the extent of enrichment with Te-0 is not th e same for A and B surfaces. Arguments are developed in favour of the heterophase nature of the etched surface. The presence of water in the etches leads to Te-0 oxidation in the course of etching. The mechanis m of etching is discussed based on the data obtained.