We report results of high-speed polarization relaxation measurements i
n ferroelectric thin film capacitors. Polarization relaxation has been
reported to occur in two distinct time regimes, one for relaxation ti
mes in the range of a few milliseconds and a second for longer relaxat
ion times. We find that the polarization relaxation in the first regim
e is governed by at least two different physical processes, namely dep
oling fields and the activation field for switching. Using prototypica
l epitaxial PbZr0.2Ti0.8O3 and Pb0.9La0.1Zr0.2Ti0.8O3 test capacitors,
we demonstrate the effect of film microstructure and switching speed
on the relaxation dynamics in the first regime. (C) 1998 American Inst
itute of Physics. [S0003-6951(98)03125-8].