STRUCTURAL AND ELECTRONIC-PROPERTIES OF LOW DIELECTRIC-CONSTANT FLUORINATED AMORPHOUS-CARBON FILMS

Authors
MA YJ YANG HN GUO J SATHE C AGUI A NORDGREN J
Citation
Yj. Ma et al., STRUCTURAL AND ELECTRONIC-PROPERTIES OF LOW DIELECTRIC-CONSTANT FLUORINATED AMORPHOUS-CARBON FILMS, Applied physics letters, 72(25), 1998, pp. 3353-3355
Citations number
16
Categorie Soggetti
Physics, Applied
Journal title
Applied physics letters → ACNP
ISSN journal
00036951
Volume
72
Issue
25
Year of publication
1998
Pages
3353 - 3355
Database
ISI
SICI code
0003-6951(1998)72:25<3353:SAEOLD>2.0.ZU;2-9
Abstract
Fluorinated amorphous carbon (a-CFx) films were studied by high-resolu tion x-ray absorption, emission, and photoelectron spectroscopy. The c omposition and local bonding information were obtained and correlated with substrate temperature during deposition. The data suggest that th e structure of the a-CFx is mostly of carbon rings connected by CF2 gr oups. The cross linking increases with substrate temperature. (C) 1998 American Institute of Physics. [S0003-6951(98)04525-2].