RESONANT INTERBAND TUNNELING CURRENT IN INAS ALSB/GASB/ALSB/INAS DOUBLE-BARRIER DIODES/

Citation
H. Kitabayashi et al., RESONANT INTERBAND TUNNELING CURRENT IN INAS ALSB/GASB/ALSB/INAS DOUBLE-BARRIER DIODES/, Journal of applied physics, 84(3), 1998, pp. 1460-1466
Citations number
19
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
84
Issue
3
Year of publication
1998
Pages
1460 - 1466
Database
ISI
SICI code
0021-8979(1998)84:3<1460:RITCII>2.0.ZU;2-1
Abstract
We have investigated the resonant interband tunneling currents (I-RIT) in InAs/AlSb/GaSb/AlSb/InAs double-barrier resonant interband tunneli ng diodes. We have prepared samples with various thicknesses of the Ga Sb well (L-w) ranging from 5 to 47 monolayers (ML) and various thickne sses of the AlSb barrier (L-b) ranging from 0 to 5 ML, and analyzed th e dependence of I-RIT on these thicknesses. As L-w increases, I-RIT in creases if L-w is smaller than a certain boundary value of L-w (L-w(b) ), but I-RIT decreases if L-w is larger than L-w(b). We have found tha t this boundary value L-w(b) depends on L-b, that is, L-w(b) decreases from 23 to 10 ML when L-b changes from 0.5 to 5 ML. Furthermore, we h ave also found that, for constant L-w, I-RIT increases as L-b increase s to a certain boundary value of L-b, and I-RIT decreases for further increase in L-b. These marked behaviors of L-w(b) and IRIT on L-b are characteristic of the type II material systems and cannot be explained by the conventional model applied to type I resonant tunneling diodes . To explain these characteristic behaviors, we propose a model where the resonance level in the valence band of the GaSb well moves up towa rd the valence-band edge with an increase in L-b. (C) 1998 American In stitute of Physics.