STRUCTURAL AND MAGNETIC FOURFOLD SYMMETRY OF CO CU MULTILAYERS ELECTRODEPOSITED ON SI(001) SUBSTRATES/

We have observed in-plane fourfold symmetry of the magnetization and m agnetoresistance in Co/Cu multilayers electrodeposited on Si(001) subs trates covered with a thin evaporated Cu seed layer. The fourfold symm etry correlates with the in-plane crystalline structure of the multila yers. High-angle x-ray diffraction shows that the Co/Cu multilayers ha ve a strong (001) texture. Phi-scan x-ray diffraction reveals that the multilayers have fourfold symmetry in the plane with a 45 degrees rot ation with respect to the Si substrates. We estimated an anisotropy fi eld of 98 mT from vector magnetization curves, which is in fairly good agreement with the value obtained from Co/Cu multilayers electrodepos ited on (001) Cu single crystal substrates. The giant magnetoresistanc e appears to depend on the in-plane orientation of the multilayer due to the magnetocrystalline anisotropy. (C) 1998 American Institute of P hysics. [S0021-8979(98)00415-0].