A self-assembled diblock copolymer mask teamed with conventional ion e
tching is one approach to nanometer patterning of surfaces. An ultrath
in film of polystyrene-black-poly(2-vinylpyridine) on mica is shown to
yield isolated, regularly arranged clusters of polystyrene surrounded
by a thin Layer of poly(2-vinylpyridine) see Figure. Subsequent selec
tive deposition of a metal film followed by etching results in surface
patterning.