THE ROLE OF DISLOCATION SCATTERING IN N-TYPE GAN FILMS

Citation
Hm. Ng et al., THE ROLE OF DISLOCATION SCATTERING IN N-TYPE GAN FILMS, Applied physics letters, 73(6), 1998, pp. 821-823
Citations number
10
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
73
Issue
6
Year of publication
1998
Pages
821 - 823
Database
ISI
SICI code
0003-6951(1998)73:6<821:TRODSI>2.0.ZU;2-M
Abstract
The lateral transport in GaN films produced by electron cyclotron reso nance plasma-assisted molecular beam epitaxy doped II type with Si to the levels of 10(15)-10(20) cm(-3) was investigated. The room temperat ure electron mobility versus carrier concentration was found to follow a family of bell-shaped corves consistent with a recently proposed mo del of scattering by charged dislocations. The mechanism of this scatt ering was investigated by studying the temperature dependence of the c arrier concentration and electron mobility. It was found that in the l ow carrier concentration region (< 10(17) cm(-3)), the electron mobili ty is thermally activated with an activation energy half of that of ca rrier concentration, This is in agreement with the prediction of the d islocation model. (C) 1998 American Institute of Physics. [S0003-6951( 98)02532-7].