Reflection anisotropy (RA) spectroscopy has been used to examine the i
n vacuo (001) surface of InP before and during growth by molecular bea
m epitaxy (MBE). The dominant effect on the RE signal occurring the in
itiation of growth is the change in the surface V/III ratio, caused by
the exposure of the surface to the incident indium flux. During MBE g
rowth of InP under commonly used conditions, RA oscillations are clear
ly observed. These oscillations have been confirmed to correspond to t
he growth of InP monolayers. The oscillations are tentatively ascribed
to the variation in P coverage during the growth of each monolayer of
material. (C) 1998 American Institute of Physics.