Dewetting of polystyrene films on a silicon substrate is investigated
as a function of film thickness h. We observe the nucleation of holes
in the early stage of dewetting for relatively thick films (h > 100 An
gstrom), as observed previously, but the breakup of thinner films occu
rs through the growth of uniformly distributed surface undulations (''
spinodal dewetting''). The average amplitude delta h of these undulati
ons increases exponentially up to the film rupture point where delta h
becomes comparable to h, as predicted by a capillary wave instability
model.