A monolithic 1.3 mu m resonant cavity light emitting diode grown by so
lid source molecular beam epitaxy is demonstrated. The diode has a 1 l
ambda thick GaInAsP optical cavity active region surrounded by GaInAsP
distributed Bragg reflectors. The device exhibits strong spontaneous
emission with a narrow linewidth of 13 nm. The results also clearly de
monstrate the accuracy of solid source molecular beam epitaxy for the
growth of complex and thick GaInAsP-based device structures.