The stability of tunneling-thin (2-3 nm) SiO2 films during prolonged f
low of high-density currents (10(2) - 10(3) A/cm(2)) was investigated.
A sharp increase in the charge which a tunneling MOS structure is cap
able of transmitting without degradation on switching from Fowler-Nord
heim injection to direct tunneling (10(3) C/cm(2) and 10(7) C/cm(2), r
espectively) was observed. The degradation of SiO2 films was investiga
ted using Al/SiO2/n-Si/p(+)-Si thyristor structures with a positive bi
as on the semiconductor, i.e., with reverse bias of the MOS structure.
The use of these devices accounted for the uniformity of the current
distribution over the area and made it possible to monitor the state o
f the insulator layer by measuring the device gain in the phototransis
tor mode. (C) 1998 American Institute of Physics.