FABRICATION AND FIELD-EMISSION PROPERTIES OF POLY-DIAMOND FILMS

Authors
Citation
Bk. Ju et al., FABRICATION AND FIELD-EMISSION PROPERTIES OF POLY-DIAMOND FILMS, Microelectronics, 29(11), 1998, pp. 855-859
Citations number
9
Categorie Soggetti
Engineering, Eletrical & Electronic
Journal title
ISSN journal
00262692
Volume
29
Issue
11
Year of publication
1998
Pages
855 - 859
Database
ISI
SICI code
0026-2692(1998)29:11<855:FAFPOP>2.0.ZU;2-9
Abstract
By using a substrate transferring technique, poly-diamond thick films having a smooth or rough surface could be fabricated as field emitter materials. The diamond film with a smooth surface, which was transferr ed from the interface between the (100) Si substrate and poly diamond deposited by plasma-enhanced CVD, showed better field emission propert ies in terms of emission current density with improved vacuum level de pendence as compared with original poly-diamond film from a rough surf ace. (C) 1998 Elsevier Science Ltd. All rights reserved.