W. Fukarek et al., DAMAGE IN SILICON-CARBIDE INDUCED BY RUTHERFORD BACKSCATTERING ANALYSIS, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 142(4), 1998, pp. 561-570
Damage in silicon carbide generated by ion implantation or irradiation
is usually analyzed by Rutherford backscattering spectroscopy in comb
ination with channeling (RBS/C) of MeV He+ ions, a technique which is
considered to be largely non-destructive. In this paper we report on s
welling of 6H-SiC induced by He+ implantation at doses commensurate wi
th, or lower than those commonly used for obtaining RBS/C spectra of d
esirable statistics. The swelling increases by about 40% if the He+ io
ns are implanted in a non-channeling direction. The formation of high
concentrations of deep-reaching (mu m range) defects due to RBS/C is c
onfirmed by slow positron implantation spectroscopy (SPIS) measurement
s. An optical damage depth-profile, with distinct optical properties c
orresponding to the regions of electronic and nuclear stopping, is obt
ained from a fit to polarized infrared reflection spectroscopy (PIRR)
data and compared to TRIM calculation. Auger electron spectroscopy (AE
S) shows that the specific color of the implanted area is not due to t
he deposition of a thin surface film during He+ implantation, and the
swelling is not related to chemical reactions in the near-surface regi
on. The formation of additional disorder from RBS/C may corrupt the re
spective data obtained subsequently by SPIS and PIRR. Therefore, RBS/C
measurements should always be carried out last, i.e. following analyt
ical techniques which are certainly non-destructive. (C) 1998 Elsevier
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