INFLUENCE OF FILM THICKNESS AND SUBSTRATE ON THE GROWTH OF SPRAYED SNO(2) - F FILMS

Citation
C. Agashe et Br. Marathe, INFLUENCE OF FILM THICKNESS AND SUBSTRATE ON THE GROWTH OF SPRAYED SNO(2) - F FILMS, Journal of physics. D, Applied physics, 26(11), 1993, pp. 2049-2054
Citations number
23
Categorie Soggetti
Physics, Applied
ISSN journal
00223727
Volume
26
Issue
11
Year of publication
1993
Pages
2049 - 2054
Database
ISI
SICI code
0022-3727(1993)26:11<2049:IOFTAS>2.0.ZU;2-L
Abstract
SnO2:F films of thicknesses up to 0.5 mum were deposited by spray pyro lysis on different substrates-Corning 7059, soda-lime glass, Si(111), polycrystalline silicon and amorphous silicon. The influence of film t hickness, as well as the substrate nature and morphology, on the growt h of the films was studied using an x-ray diffraction technique. The r esults on preferred growth were analysed using the texture coefficient TC (hkl). It was observed that as the film grows in thickness, the pr eferred growth (texture) improves up to a particular thickness, beyond which reorientational effects are observed. As a result, the thicker films have a deteriorated texture. The influence of the substrate in g overning the growth of the film is noticed up to a certain thickness, beyond which the growth becomes substrate independent. Among the subst rates mentioned above, Corning 7059 seems to have the least influence on the growth of the films. Films deposited on Corning 7059 under opti mized conditions possess the strongest preferred growth along [200].