C. Agashe et Br. Marathe, INFLUENCE OF FILM THICKNESS AND SUBSTRATE ON THE GROWTH OF SPRAYED SNO(2) - F FILMS, Journal of physics. D, Applied physics, 26(11), 1993, pp. 2049-2054
SnO2:F films of thicknesses up to 0.5 mum were deposited by spray pyro
lysis on different substrates-Corning 7059, soda-lime glass, Si(111),
polycrystalline silicon and amorphous silicon. The influence of film t
hickness, as well as the substrate nature and morphology, on the growt
h of the films was studied using an x-ray diffraction technique. The r
esults on preferred growth were analysed using the texture coefficient
TC (hkl). It was observed that as the film grows in thickness, the pr
eferred growth (texture) improves up to a particular thickness, beyond
which reorientational effects are observed. As a result, the thicker
films have a deteriorated texture. The influence of the substrate in g
overning the growth of the film is noticed up to a certain thickness,
beyond which the growth becomes substrate independent. Among the subst
rates mentioned above, Corning 7059 seems to have the least influence
on the growth of the films. Films deposited on Corning 7059 under opti
mized conditions possess the strongest preferred growth along [200].