SOFT LITHOGRAPHY

Citation
Yn. Xia et Gm. Whitesides, SOFT LITHOGRAPHY, Annual review of materials science, 28, 1998, pp. 153-184
Citations number
184
Categorie Soggetti
Material Science
ISSN journal
00846600
Volume
28
Year of publication
1998
Pages
153 - 184
Database
ISI
SICI code
0084-6600(1998)28:<153:>2.0.ZU;2-W
Abstract
Soft lithography represents a non-photolithographic strategy based on self-assembly and replica molding for carrying out micro- and nanofabr ication. It provides a convenient, effective, and low-cost method for the formation and manufacturing of micro- and nanostructures. In soft lithography, an elastomeric stamp with patterned relief structures on its surface is used to generate patterns and structures with feature s izes ranging from 30 nm to 100 mu m. Five techniques have been demonst rated: microcontact printing (mu CP), replica molding (REM), microtran sfer molding (mu TM), micromolding in capillaries (MIMIC), and solvent -assisted micromolding (SAMIM). In this chapter we discuss the procedu res for these techniques and their applications in micro- and nanofabr ication, surface chemistry, materials science, optics, MEMS, and micro electronics.