A MODEL STUDY OF THE SURFACE DISCHARGE INDUCED PLASMA CHEMICAL PROCESS

Here we present an equivalent circuit model for the study of the surfa ce discharge induced plasma chemical process (SPCP). The simplified mo del consists of a series of gaseous and ceramic capacitors. The discha rge characteristics of the SPCP device are investigated based on this model. The discharge current, the average length of the streamer filam ents, the inception breakdown voltage, the density of the surface char ges, the dynamic capacity and the effective energy associated with the discharge process are simulated. The computed results are in good agr eement with the experimental data.