INFLUENCE OF MG AND SI ON THE OXIDATION OF ALUMINUM

Citation
A. Nylund et al., INFLUENCE OF MG AND SI ON THE OXIDATION OF ALUMINUM, Oxidation of metals, 50(3-4), 1998, pp. 309-325
Citations number
28
Categorie Soggetti
Metallurgy & Metallurigical Engineering
Journal title
ISSN journal
0030770X
Volume
50
Issue
3-4
Year of publication
1998
Pages
309 - 325
Database
ISI
SICI code
0030-770X(1998)50:3-4<309:IOMASO>2.0.ZU;2-0
Abstract
Test materials of pure Al, Al alloyed with 10, 50, and 190 ppm Mg, and Al alloyed with 10 ppm Mg + 500 ppm Si were oxidized at temperatures ranging from 250 to 620 degrees C, The composition and thickness of th e oxide film were determined by electron spectroscopy for chemical ana lysis (ESCA) and Auger spectroscopy. Below the crystallization tempera ture (400 degrees C) of Al2O3, Mg2+ is enriched in the interior portio n of the oxide. The enrichment of Mg2+ gives a somewhat thinner oxide compared with the oxide formed on pure Al. Above 400 degrees C, MgO is formed as a separate phase on the surface of the Al2O3. The Si-contai ning material showed Si4+ enrichment in the surface oxide. Mg2+ specie s were not detectable, Silicon is also strongly enriched in the metal phase just below the metal-oxide interface.