Recently high temperature dependence of series resistance was obtained
in Ag/n-Si and Al/n-Si/p-Si Schottky junctions prepared by ionised cl
uster beam deposition and by plasma immersion implantation, respective
ly. In this work it is shown by experiments that this feature was due
to the poor quality of backside ohmic contacts. (C) 1998 Elsevier Scie
nce Ltd. All rights reserved.