NUMERICAL-CALCULATION OF PULSED-LASER DEPOSITED FILM PROFILES

Pulsed laser deposition (PLD) is a straightforward method for producti on of the widest variety of materials, especially multicomponent oxide s, in the form of thin film. One of the particular advantages of this technique, the possibility of control of film composition, is ensured by applying (reactive) atmospheres of pressures up to tenths of millib ars. The extension dynamics of the laser generated plasma plume is sim ulated based on a microscopic collision model using Monte-Carlo calcul ations. The calculated spatial distribution of the film material as a function of pressure is compared to measured thickness profiles of bis muth films deposited in argon atmosphere. The numerical calculation is successfully applied for the interpretation of the main features obta ined in the 10(-6)-10(-1) mbar pressure range, i. e. the decrease in d eposition rate and the broadening of the film thickness profiles with increasing pressure. (C) 1998 Elsevier Science Ltd. All rights reserve d.