HYDROGEN EVOLUTION ON THIN-FILM DEPOSITED ELECTRODES PREPARED BY A PLASMA-BASED TECHNIQUE

New electrode materials prepared by an ion-plating-like technique were characterized for hydrogen evolution reaction (HER) in 1 M ROH at 25 degrees C. The device used allows a metallic deposition under glow-dis charge conditions simultaneously with an ionic bombardment of argon. T he electrodes were tested by steady-state polarization and ac impedanc e techniques for two deposited metals: Ni and Pd. It has been found th at the HER mechanism proceeds via the Volmer-Heyrovsky pathway. Furthe rmore the morphology of the coating and the electrochemical behavior o f the electrodes were linked to both the amount and the nature of the deposited catalytic material.