Sj. Harris et al., REACTION-MECHANISM FOR THE THERMAL-DECOMPOSITION OF BCL3 H-2 GAS-MIXTURES/, Journal of the Electrochemical Society, 145(9), 1998, pp. 3203-3211
Citations number
24
Categorie Soggetti
Electrochemistry,"Materials Science, Coatings & Films
Chemical vapor deposition of boron-containing species often involves t
he thermal decomposition of BCl3 in an H-2 carrier gas. However, model
ing this process has been impeded by a lack of information about rate
constants involving BHmCln (0 less than or equal to m + n less than or
equal to 3). We have previously used ab initio quantum calculations a
t the G2 level of theory to generate thermodynamic, vibrational, and s
tructural information about these species and about transition states
involving reactions of these species. In the present work, transition
state theory and Rice-Ramsberger-Kassel-Marcus theory were used to cal
culate rate constants which are important in the thermal decomposition
of BCl3. From the resulting reaction mechanism we perform some sample
calculations that indicate which boron-containing species might be th
e most important growth species, and identify the rate constants to wh
ich values the calculations are most sensitive.