IN-SITU INFRARED STUDY OF THE OSCILLATING ANODIC-DISSOLUTION OF SILICON IN FLUORIDE ELECTROLYTES (VOL 145, PG 964, 1998)

Authors
CHAZALVIEL JN DAFONSECA C OZANAM F
Citation
Jn. Chazalviel et al., IN-SITU INFRARED STUDY OF THE OSCILLATING ANODIC-DISSOLUTION OF SILICON IN FLUORIDE ELECTROLYTES (VOL 145, PG 964, 1998), Journal of the Electrochemical Society, 145(9), 1998, pp. 3312-3312
Citations number
4
Categorie Soggetti
Electrochemistry,"Materials Science, Coatings & Films
Journal title
Journal of the Electrochemical Society → ACNP
ISSN journal
00134651
Volume
145
Issue
9
Year of publication
1998
Pages
3312 - 3312
Database
ISI
SICI code
0013-4651(1998)145:9<3312:IISOTO>2.0.ZU;2-O