SPUTTER INDUCED TOPOGRAPHY ON SILVER-COATED SILICON-NITRIDE CERAMICS BY UNFOCUSED NEUTRAL PRIMARY BEAM SELECTED-ION MASS-SPECTROMETRY

Citation
W. Dummler et al., SPUTTER INDUCED TOPOGRAPHY ON SILVER-COATED SILICON-NITRIDE CERAMICS BY UNFOCUSED NEUTRAL PRIMARY BEAM SELECTED-ION MASS-SPECTROMETRY, International journal of mass spectrometry and ion processes, 176(1-2), 1998, pp. 125-131
Citations number
14
Categorie Soggetti
Spectroscopy,"Physics, Atomic, Molecular & Chemical
ISSN journal
13873806
Volume
176
Issue
1-2
Year of publication
1998
Pages
125 - 131
Database
ISI
SICI code
1387-3806(1998)176:1-2<125:SITOSS>2.0.ZU;2-A
Abstract
In a specially modified apparatus for secondary ion mass spectrometry, silver-coated and uncoated silicon nitride ceramics were sputtered by means of unfocused neutral particle bombardment. The roughnesses of t he obtained craters were measured by atomic force microscopy, in order to examine changes of the surface topography as a function of eroded depth. The unfocused neutral particle bombardment of a silver-coated s ilicon nitride ceramic was found to change the crater bottom roughness in a different way in the silver layer and the silicon nitride bulk, and the highest roughness was found to occur just at the interface. (I nt J Mass Spectrom 176 (1998) 125-131) (C) 1998 Elsevier Science B.V.