The properties of ZnSe epilayers fabricated by molecular beam epitaxy
on lattice-matched InxGa1-xAs buffers grown on GaAs(001) substrates ha
ve been investigated by means of photoluminescence spectroscopy and tr
ansmission electron microscopy. For suitable values of x and ternary-l
ayer thickness, the partial character of the strain relaxation within
the III-V layer can be compensated for, minimizing the residual strain
in the ZnSe overlayer. Large reductions in the dislocation density an
d Y-line emission as compared to conventional ZnSe/GaAs heterostructur
es can be reproducibly obtained.