MELTING INDUCED BY EPITAXIAL STRESS

Authors
Citation
Dj. Bottomley, MELTING INDUCED BY EPITAXIAL STRESS, JPN J A P 1, 37(5A), 1998, pp. 2652-2655
Citations number
22
Categorie Soggetti
Physics, Applied
Volume
37
Issue
5A
Year of publication
1998
Pages
2652 - 2655
Database
ISI
SICI code
Abstract
\Unprecedented phenomena observed in the epitaxial growth of certain z incblende structure III-V compounds in the past several years are acco unted for on the basis of the melting of the epitaxial layer due to th e large magnitude of the epitaxial strain (3.2% to 7.3%). The cases co nsidered include InSb on InAs, GaSb on GaAs, InAs on GaAs and InAs on InP. The molar Gibbs free energy of the stress-free liquid phase is co mpared with that of the stressed solid film. Melting is predicted for temperatures hundreds of degrees Kelvin lower than the atmospheric pre ssure melting point. The resulting molten material is an epitaxially s tabilized supercooled liquid.