A MULTILAYER-COATED REFLECTION MIRROR FOR MICROFABRICATION

We propose a multilayer-coated mirror for the first mirror of a beamli ne. Calculated reflectivities of over 80% for B4C/W and C/Ni constant d-spacing multilayer-coated mirrors are obtained at 6 keV. Moreover, b y using the constant d-spacing multilayer-coated mirror, a monochromat ic light source with high reflectivity and high resolution is obtained at the glancing angle of 1.5 degrees. Furthermore, it is determined t hat a graded d-spacing multilayer-coated mirror, i.e., a supermirror, is effective in this photon energy region since the half-width at half -maximum of the reflectivity increases. A multilayer-coated reflection mirror for beamline optics is promising for applications in microfabr ication and structure analysis of materials.