T. Imai et al., ACCURACY IN THE QUANTITATIVE PHASE-ANALYSIS OF SILICON NITRIDES, Nippon Seramikkusu Kyokai gakujutsu ronbunshi, 106(8), 1998, pp. 798-807
The accuracy in the quantitative phase analysis (QPB) of alpha- and be
ta-silicon nitrides using the Gazzara method, the Rietveld method and
the Whole-Powder-Pattern Decomposition (WPPD) method was examined. Int
egrated intensities, which were obtained by a profile fitting techniqu
e, and peak intensities were used for the Gazzara method. Experimental
and analysis conditions were varied, and their influences on the accu
racy of the QPA were examined. Model parameters in profile fittings, t
he Rietveld method and the WPPD method were optimized, and the standar
d settings for powder diffraction experiment were established. Under t
he optimized condition the three methods for the QPA gave errors, meas
ured as the deviation from weighed value, of 0.9, 0.8 and 0.4 mass% at
the maximum and of 0.3, 0.4 and 0.1 mass% on the average. On the othe
r hand, the Gazzara method using peak-intensities gave a less accurate
result ranging up to 6.4 mass%.