ALLYL(BETA-DIKETONATO)PALLADIUM(II) COMPLEXES, INCLUDING LIQUID PRECURSORS, FOR CHEMICAL-VAPOR-DEPOSITION OF PALLADIUM

Citation
Yp. Zhang et al., ALLYL(BETA-DIKETONATO)PALLADIUM(II) COMPLEXES, INCLUDING LIQUID PRECURSORS, FOR CHEMICAL-VAPOR-DEPOSITION OF PALLADIUM, Chemistry of materials, 10(8), 1998, pp. 2293-2300
Citations number
36
Categorie Soggetti
Chemistry Physical","Material Science
Journal title
ISSN journal
08974756
Volume
10
Issue
8
Year of publication
1998
Pages
2293 - 2300
Database
ISI
SICI code
0897-4756(1998)10:8<2293:ACILP>2.0.ZU;2-C
Abstract
The synthesis, characterization, and application as chemical vapor dep osition (CVD) precursors of several new complexes of the type eta(3)-a llyl(beta-diketonato)palladium(II) are reported. Some of these include the first liquid precursors for CVD of thin films of pure palladium. The CVD can be conducted at 170-315 degrees C, and the purest films ar e obtained using oxygen as the carrier gas, either at atmospheric pres sure or under partial vacuum. Some observations with respect to the me chanism of the CVD process are also described.