Yp. Zhang et al., ALLYL(BETA-DIKETONATO)PALLADIUM(II) COMPLEXES, INCLUDING LIQUID PRECURSORS, FOR CHEMICAL-VAPOR-DEPOSITION OF PALLADIUM, Chemistry of materials, 10(8), 1998, pp. 2293-2300
The synthesis, characterization, and application as chemical vapor dep
osition (CVD) precursors of several new complexes of the type eta(3)-a
llyl(beta-diketonato)palladium(II) are reported. Some of these include
the first liquid precursors for CVD of thin films of pure palladium.
The CVD can be conducted at 170-315 degrees C, and the purest films ar
e obtained using oxygen as the carrier gas, either at atmospheric pres
sure or under partial vacuum. Some observations with respect to the me
chanism of the CVD process are also described.