A 0.15 mu m high gain, passivated, double-side-doped InAlAs/InGaAs HEM
T with high uniformity over 2 in InP substrates has been developed. A
measured gain of 12.5 dB at 94 GHz was achieved at a drain bias of 2 V
, giving an f(max) exceeding 400 GHz. This high gain is mainly related
to the extremely low gate-drain Feedback capacitance, for which the p
hysical origins will be demonstrated. Using this technology, a single
stage amplifier with 10.3 dB gain at 88 GHz and a distributed amplifie
r with 11 dB gain and 89 GHz bandwidth were fabricated.