STRUCTURAL STUDIES OF ITO FILMS USING GRAZING-INCIDENCE X-RAY-DIFFRACTOMETRY

Tin doped indium oxide (ITO) films deposited by e-beam evaporation wer e investigated using grazing incidence x-ray diffractometry (GIXRD). W ith increasing doping concentration the x-ray peak positions are shift ed to lower angles and the line profiles become broader. Rietveld refi nements show that tin in small concentrations occupies regular In site s. Line profile analysis reveals that higher tin concentrations cause an increasing of lattice defects, as grain boundaries and microstrains . The results of the structural investigations correlate with resistiv ity measurements.