IN-SITU AND EX-SITU EXAMINATION OF THE EARLY STAGES OF CHEMICAL-VAPOR-DEPOSITION

Authors
STOCK HR JARMS C BERNDT H WIELAGE B HOFMANN A
Citation
Hr. Stock et al., IN-SITU AND EX-SITU EXAMINATION OF THE EARLY STAGES OF CHEMICAL-VAPOR-DEPOSITION, Fresenius' journal of analytical chemistry, 361(6-7), 1998, pp. 645-646
Citations number
6
Categorie Soggetti
Chemistry Analytical
Journal title
Fresenius' journal of analytical chemistry → ACNP
ISSN journal
09370633
Volume
361
Issue
6-7
Year of publication
1998
Pages
645 - 646
Database
ISI
SICI code
0937-0633(1998)361:6-7<645:IAEEOT>2.0.ZU;2-S
Abstract
A cold working steel was coated both with high temperature CVD (TiN) a nd moderate temperature CVD (Ti[C,N]). AES depth profiles show a signi ficant difference at the interface, where a thin oxide layer remains d etectable at deposition temperatures of 750 degrees C. It could be sho wn that an impedance signal at a frequency of 13 MHz is well suited to detect the early stages of the growth of a CVD coating.