MICROWAVE PLASMA CHEMICAL-VAPOR-DEPOSITION OF DIAMOND-LIKE CARBON THIN-FILMS

Diamond Like Carbon (DLC) films (a-C:H) due to their extreme propertie s have attracted a lot of attention. The properties of this non crysta lline material cover a wide range and are intermediate between the pro perties of diamond, graphite and hydrocarbon polymers. The properties depend on the experimental parameters. Under appropriate deposition co ndition very hard, chemically inert and optically transparent films ca n be prepared. Diamond like carbon films have been deposited by low pr essure Microwave Induced Plasma Chemical Vapour Deposition (CVD) proce ss. The parameters have been optimized to get DLC films on the substra te like s.s/m.s., Copper and Cu-Be. The deposited films have been char acterized by Fourier Transform Infra Red (FTIR) and Raman spectroscopy . The corrosion resistance of the films was found to be excellent. FTI R characterization indicates that the carbon is bonded in the sp(3) fo rm with hydrogen participating in bonding. Raman spectra confirms the DLC characteristics of the films. In this paper experimental details a nd results are discussed. (C) 1998 Elsevier Science S.A. All rights re served.