Infrared reflectivity measurements have been carried out on samples wi
th structures of GaN/sapphire and AlxGa1-x/N/GaN/sapphire as well as s
apphire substrates. Analyses of the reflectance data of sapphire using
the Kramers-Kronig technique and fitting of the reflectance spectra o
f GaN and AlxGa1-xN samples using analytical expressions have been mad
e. The high-frequency dielectric constant epsilon(alpha) and the trans
verse phonon frequency omega(TO), are found to vary from 5.15 to 4.2 a
nd from 559.7 to 586.3 cm(-1), respectively, when the composition x is
varied from 0 to 0.35 at room temperature. The E2 mode, which arises
from the disordered stale of the alloys, has been observed in the refl
ectivity spectrum of AlxGa1-xN, and the intensity of the peak is enhan
ced by increasing the Al content. (C) 1998 American Institute of Physi
cs.