STRUCTURE OF NITRIDE FILM HARD COATINGS PREPARED BY REACTIVE MAGNETRON SPUTTERING

Authors
MANAILA R BIRO D DEVENYI A FRATILOIU D POPESCU R TOTOLICI JE
Citation
R. Manaila et al., STRUCTURE OF NITRIDE FILM HARD COATINGS PREPARED BY REACTIVE MAGNETRON SPUTTERING, Applied surface science, 134(1-4), 1998, pp. 1-10
Citations number
24
Categorie Soggetti
Physics, Applied","Physics, Condensed Matter","Chemistry Physical","Materials Science, Coatings & Films
Journal title
Applied surface science → ACNP
ISSN journal
01694332
Volume
134
Issue
1-4
Year of publication
1998
Pages
1 - 10
Database
ISI
SICI code
0169-4332(1998)134:1-4<1:SONFHC>2.0.ZU;2-S
Abstract
TiN, Ti1-xAlxN and ZrN films were deposited by electron-beam- assisted de magnetron sputtering. X-ray diffraction showed different degrees o f texture, depending on substrate bias, temperature and composition. I n TiN films deposited with a high bias, microstructure changes were ev idenced from lattice parameter trends, attributable to Ar inclusions. Ti1-xAlxN cubic solid solutions showed an average x = 0.10. In ZrN fil ms, a rhombohedrally-distorted phase is present, besides the cubic one . (C) 1998 Elsevier Science B.V. All rights reserved.