QUANTUM-SIZE EFFECT FROM N-TYPE POROUS SILICON

Citation
Z. Mouffak et al., QUANTUM-SIZE EFFECT FROM N-TYPE POROUS SILICON, Microelectronic engineering, 43-4, 1998, pp. 655-659
Citations number
16
Categorie Soggetti
Optics,"Physics, Applied","Engineering, Eletrical & Electronic
Journal title
ISSN journal
01679317
Volume
43-4
Year of publication
1998
Pages
655 - 659
Database
ISI
SICI code
0167-9317(1998)43-4:<655:QEFNPS>2.0.ZU;2-B
Abstract
N-type and p-type Porous Silicon (PSi) have been observed by Scanning Electron Micrograph (SEM) and characterised by Photoluminescence (PL). The porous n-type silicon obtained under illumination (photoelectroch emical etching), consists of a layer of nanoporous silicon which cover s a macroporous silicon layer with pores in the micron size range. Com pared with the p-type PSi, the room temperature visible luminescence i s many times reduced in the case of n-type PSi, and there is a photolu minescence peak shift to higher wavelengths. This shows that the lumin escence from porous silicon is caused by quantum size effect. 1998 Pub lished by Elsevier Science B.V. All rights reserved.