Thin gold films (t<10 nm) are prepared in an UHV system simultaneously
onto quartz substrates for resistance measurements and onto NaCl crys
tals for electron-microscopic investigation. Both samples are irradiat
ed by Ar+ ions with various fluences. The temperature dependence of th
e resistance and the magnetoresistance (B <5 T) is measured for the no
nirradiated samples as well as for the irradiated samples. Accordingly
, each pair of samples is investigated by TEM to examine the influence
of irradiation on the film topography. From this it is possible to ex
plain the variation of the conductivity behavior for the irradiated an
d nonirradiated gold films. By magnetoresistance measurements we find
a gradual shift from normal to anomalous electron diffusion due to the
topographical changes in the Au films.