MODIFICATION OF SI(100) SUBSTRATE BONDING BY ADSORBED GE OR SI DIMER ISLANDS

Citation
Xr. Qin et al., MODIFICATION OF SI(100) SUBSTRATE BONDING BY ADSORBED GE OR SI DIMER ISLANDS, Physical review letters, 81(11), 1998, pp. 2288-2291
Citations number
17
Categorie Soggetti
Physics
Journal title
ISSN journal
00319007
Volume
81
Issue
11
Year of publication
1998
Pages
2288 - 2291
Database
ISI
SICI code
0031-9007(1998)81:11<2288:MOSSBB>2.0.ZU;2-D
Abstract
High-resolution scanning tunneling microscopy studies of the Si(100)-( 2 x 1) surface show a heretofore unrecognized distortion of the substr ate structure when islands form during the initial stage of growth of either Si or Ge. The distortion, reflecting the influence of strain, e xtends at least three dimers away from the adsorption sites. We presen t a realistic structural model.