We combine in a unique approach two modern ultrathin film techniques f
or production of heterostructure films. These are plasma deposition (w
hich permitted one to obtain thin 20-500-angstrom well-defined layers
on any solid surface with an active, in our case charged, surface) and
layer-by-layer deposition of the polycation/polyanion self-assembly.
The latter technique was recently developed in our group and is based
on the electrostatic attraction between opposite charges. Alternating
adsorption of anionic and cationic polyelectrolytes from their aqueous
solution onto charged substrate leads to the formation of multilayer
assemblies. The multilayer heterostructure film was monitored by small
-angle X-ray reflectivity. Oxygen, methane, argon, and polysiloxane pl
asma coating were tested as a precursor treatment for polyion assembly
. The procedure was successfully accomplished for methane plasma depos
ition onto a glass substrate with further oxidation and consequent alt
ernate assembling of a layer of polyallylamine (PAH) and polystyrenesu
lfonate (PSS). The step size of growth for the deposited PAH/PSS pair
was 50 +/- 1 angstrom. Model fitting of the X-ray reflectivity data al
lowed us to calculate the electron density profiles of plasma-deposite
d plus polymer-assembled heterofilms and to characterize the thickness
and roughness of its composite layers. Furthermore, the combination o
f methane plasma treatment and polyelectrolyte self-assembly opens a n
ew approach for constructing inorganic/organic nanocomposite films.